Immersion photolithography system and method using microchannel nozzles
US6867844B2 · kind B2 · utility
278Cited by
6References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2003 |
| Grant date | Mar 15, 2005 |
| Priority date | — |
| Expiry date | Jun 19, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/027
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.