Klaus Simon
86Patents
19h-index
75Co-inventors
87Inventor score
Filing activity: Feb 25, 1974 → Dec 9, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6952253B2 | Lithographic apparatus and device manufacturing method | Physics | 706 | Expired |
| US7199858B2 | Lithographic apparatus and device manufacturing method | Physics | 298 | Expired |
| US6867844B2 | Immersion photolithography system and method using microchannel nozzles | Electricity | 278 | Expired |
| US7081943B2 | Lithographic apparatus and device manufacturing method | Physics | 171 | Expired |
| US7193232B2 | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid | Physics | 168 | Expired |
| US7213963B2 | Lithographic apparatus and device manufacturing method | Physics | 160 | Expired |
| US7352434B2 | Lithographic apparatus and device manufacturing method | Physics | 134 | Expired |
| US7388648B2 | Lithographic projection apparatus | Physics | 115 | Expired |
| US7359030B2 | Lithographic apparatus and device manufacturing method | Chemistry; Metallurgy | 74 | Expired |
| US7593093B2 | Lithographic apparatus and device manufacturing method | Physics | 69 | Active |
| US7372541B2 | Lithographic apparatus and device manufacturing method | Physics | 67 | Expired |
| US7038760B2 | Lithographic apparatus and device manufacturing method | Physics | 65 | Expired |
| US7593092B2 | Lithographic apparatus and device manufacturing method | Physics | 56 | Active |
| US7482611B2 | Lithographic apparatus and device manufacturing method | Physics | 51 | Expired |
| US7738074B2 | Lithographic apparatus and device manufacturing method | Physics | 46 | Expired |
| US8482845B2 | Lithographic apparatus and device manufacturing method | Physics | 30 | Active |
| US7936444B2 | Lithographic apparatus and device manufacturing method | Physics | 26 | Active |
| US8154708B2 | Lithographic apparatus and device manufacturing method | Physics | 20 | Active |
| US7507675B2 | Device manufacturing method and device | Emerging Cross-Sectional Technologies | 19 | Expired |
| US7517211B2 | Imprint lithography | Performing Operations; Transporting | 14 | Active |
| US9366972B2 | Lithographic apparatus and device manufacturing method | Physics | 13 | Active |
| US7982850B2 | Immersion lithographic apparatus and device manufacturing method with gas supply | Physics | 13 | Active |
| US9482966B2 | Lithographic apparatus and device manufacturing method | Physics | 11 | Active |
| US7411650B2 | Immersion photolithography system and method using microchannel nozzles | Electricity | 10 | Expired |
| US7795603B2 | Lithographic apparatus and device manufacturing method | Physics | 10 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.