Inductively coupled plasma spectrometer for process diagnostics and control
US6867859B1 · kind B1 · utility
413Cited by
34References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 2, 2000 |
| Grant date | Mar 15, 2005 |
| Priority date | — |
| Expiry date | Mar 16, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67069
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention relates to an apparatus and method for forming a plasma in the exhaust line of a primary process reactor. The plasma is generated in an inductive source (5) to examine the chemical concentrations of the waste or exhaust gas in vacuum lines that are below atmospheric pressure. The optical radiation emitted by the plasma is analyzed by an optical spectrometer (9) and the resulting information is used to diagnose, monitor, or control operating states in the main vacuum vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.