Positive photoresist composition
US6869742B2 · kind B2 · utility
2Cited by
13References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 1, 2002 |
| Grant date | Mar 22, 2005 |
| Priority date | — |
| Expiry date | Apr 1, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.