Enabling chain scission of branched photoresist
US6872505B1 · kind B1 · utility
3Cited by
2References
9Claims
0Family size
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Key dates
| Filing date | Sep 16, 2003 |
| Grant date | Mar 29, 2005 |
| Priority date | — |
| Expiry date | Sep 16, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/914
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
By using a branched long chained chain scission polymer as a photoresist for EUV and 157 nanometer applications, a relatively higher molecular weight polymer with good mechanical properties may be achieved. In addition, by using chain scission technology, line edge roughness and resolution may be improved at the same time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.