Process endpoint detection in processing chambers
US6878214B2 · kind B2 · utility
3Cited by
21References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 24, 2002 |
| Grant date | Apr 12, 2005 |
| Priority date | — |
| Expiry date | Mar 13, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/905
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Method and apparatus for determining an endpoint of a cleaning process running in a chamber. In particular, one embodiment of the present invention is a method that includes steps of: (a) directing radiation absorbed by a byproduct of the cleaning process into an exhaust line of the chamber; (b) detecting a measure of absorbance of the radiation by the byproduct; and (c) determining the endpoint when the measure of absorbance falls within a predetermined window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.