Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
US6880942B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2003 |
| Grant date | Apr 19, 2005 |
| Priority date | — |
| Expiry date | Oct 21, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/0825
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.