Silicon wafer storage water and silicon wafer storage method
US6884721B2 · kind B2 · utility
1Cited by
9References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 22, 1998 |
| Grant date | Apr 26, 2005 |
| Priority date | — |
| Expiry date | Feb 27, 2019 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B33/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Storage water used for storage of a silicon wafer in water is disclosed. The storage water contains Cu at a concentration of 0.01 ppb or less. A method of storing a silicon wafer in water is also disclosed. In the method, water containing Cu at a concentration of 0.01 ppb or less is used. In another method, a wafer is stored in water or a chemical solution, to which a chelating agent is added. The storage water and the storage methods can prevent degradation of oxide dielectric breakdown voltage which would otherwise occur due to Cu contamination from the storage water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.