System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
US6888615B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 23, 2002 |
| Grant date | May 3, 2005 |
| Priority date | — |
| Expiry date | Jul 26, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element having a pupil plane. An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy received by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.