Patent · US Expired

System and method for creating a substrate signature

US6890774B2 · kind B2 · utility

1Cited by
6References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 4, 2002
Grant dateMay 10, 2005
Priority date
Expiry dateDec 4, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67276
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The present invention is a system for creating a signature of a substrate manufactured in a semiconductor or data storage fabrication facility. A central processing unit is configured to receive external sensor data from a plurality of equipment-types located within the facility and integrate the external sensor data, by combining the data into a unitary whole, to create the signature for the substrate. Additionally, the present invention is a method for creating a signature of the substrate by selecting a substrate from the facility process line, receiving external sensor data associated with the substrate from a plurality of equipment-types, and integrating the external sensor data associated with the substrate to create the signature of the substrate. The created substrate signature may also be compared with other substrate signatures to electronically diagnose a process, equipment associated with the process, or a processed substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.