Janet M. Flanner
16Patents
12h-index
15Co-inventors
71Inventor score
Filing activity: Aug 27, 1987 → Dec 4, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6241845A | Apparatus for reducing process drift in inductive coupled plasma etching such as oxide layer | Electricity | 232 | Expired |
| US4987099A | Method for selectively filling contacts or vias or various depths with CVD tungsten | Electricity | 81 | Expired |
| US6696366B1 | Technique for etching a low capacitance dielectric layer | Electricity | 56 | Expired |
| US4822749A | Self-aligned metallization for semiconductor device and process using selectively deposited tungsten | Emerging Cross-Sectional Technologies | 45 | Expired |
| US6426304B1 | Post etch photoresist strip with hydrogen for organosilicate glass low-&kgr; etch applications | Physics | 40 | Expired |
| US6114250A | Techniques for etching a low capacitance dielectric layer on a substrate | Electricity | 33 | Expired |
| US6410437B1 | Method for etching dual damascene structures in organosilicate glass | Electricity | 33 | Expired |
| US6383931B1 | Convertible hot edge ring to improve low-K dielectric etch | Electricity | 33 | Expired |
| US6048798A | Apparatus for reducing process drift in inductive coupled plasma etching such as oxide layer | Electricity | 33 | Expired |
| US5783496A | Methods and apparatus for etching self-aligned contacts | Electricity | 24 | Expired |
| US6653734B2 | Convertible hot edge ring to improve low-K dielectric etch | Electricity | 21 | Expired |
| US6165910A | Self-aligned contacts for semiconductor device | Electricity | 12 | Expired |
| US6133153A | Self-aligned contacts for semiconductor device | Electricity | 9 | Expired |
| US5021358A | Semiconductor fabrication process using sacrificial oxidation to reduce tunnel formation during tungsten deposition | Electricity | 4 | Expired |
| US6946303B2 | Electronically diagnosing a component in a process line using a substrate signature | Physics | 2 | Expired |
| US6890774B2 | System and method for creating a substrate signature | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.