High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices

US6891655B2 · kind B2 · utility

Assignee

• Micronic Laser Systems AB · SE

Inventors

• Thomas J. Grebinski · Sunnyvale, US
• Ulrike A. Dauderstadt · Dresden, DE
• Torbjorn Sandstrom · Mölnlycke, SE
• Ulric Ljungblad · Mölndal, SE
• Christian Kunath · Dresden, DE
• Eberhard Kurth · Radebeul, DE

Key dates

• Filing date: Jan 2, 2003
• Grant date: May 10, 2005
• Expiry date: Feb 10, 2023

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81B2201/042
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The present invention includes methods and devices that improve the radiation-resistance of a movable micromechanical optical element. In particular, a radiation-resistant layer is added to a movable micro-mechanical optical element, suitable to reduce the surface and bulk material changes to the element that result from exposure to pulsed laser energy densities less than 100 micro-joules per square centimeter and at wavelengths less than or equal to about 248 nm.