Patent · US Expired

Method and apparatus for analysis of schlieren

US6891980B2 · kind B2 · utility

12Cited by
8References
16Claims
0Family size

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Key dates

Filing dateMar 5, 2002
Grant dateMay 10, 2005
Priority date
Expiry dateNov 3, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/958
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The method for evaluating schlieren in glassy or crystalline optical materials includes irradiating a test sample of the optical material with light and producing a shadow image of the test sample on a projection screen. The shadow image of the test sample is received in an electronic image receiving device, such as a digital camera, and is compared with another shadow image of schlieren obtained with a comparison sample by means of interferometry. Then the optical material of the test sample is evaluated with the help of the comparison results.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.