Method and apparatus for analysis of schlieren
US6891980B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 5, 2002 |
| Grant date | May 10, 2005 |
| Priority date | — |
| Expiry date | Nov 3, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/958
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The method for evaluating schlieren in glassy or crystalline optical materials includes irradiating a test sample of the optical material with light and producing a shadow image of the test sample on a projection screen. The shadow image of the test sample is received in an electronic image receiving device, such as a digital camera, and is compared with another shadow image of schlieren obtained with a comparison sample by means of interferometry. Then the optical material of the test sample is evaluated with the help of the comparison results.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.