Anti-reflective coating compositions for use with low k dielectric materials
US6893684B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2002 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Jan 20, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08J2471/00
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted ring members. In another embodiment, the polymers further comprise recurring monomers comprising ring members reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.