System and method for reducing charged particle contamination
US6894294B2 · kind B2 · utility
1Cited by
3References
38Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 19, 2003 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Jun 19, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31747
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A system and method for reducing ion contamination in an object, the ion contamination introduced by a contaminating ion beam milling step. The system includes means for defining a suspected ion contaminated area; and means for removing the suspected ion contaminated area by a non-contaminating process, which usually involves directing an electron beam towards the removed area while allowing the beam to interact with additional material. The method includes the steps of defining a suspected ion contaminated area; and removing the suspected ion contaminated area by non-contaminating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.