Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same
US6894763B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 29, 2003 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Apr 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70808
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask stage RS1 and a substrate stage WS1 are synchronously moved, and a mask stage RS2 and a substrate stage RS2 are synchronously moved, in a state in which a mask on the mask stage RS1 and a mask on the mask stage RS2 are irradiated with illumination light beams from illumination optical systems IOP1, IOP2 respectively. The reaction force on a base board due to the movement of the stages can be canceled to suppress the vibration of an exposure apparatus by moving the mask stage RS1 and the mask stage RS2 in mutually opposite directions. The throughput can be improved by performing alignment operation on substrate stages WS3, WS4 concurrently with the exposure operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.