Monitoring temperature and sample characteristics using a rotating compensator ellipsometer
US6894781B2 · kind B2 · utility
0Cited by
10References
16Claims
0Family size
Assignee
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Key dates
| Filing date | May 6, 2003 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | May 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus are disclosed for accurately and repeatably determining the thickness of a thin film on a substrate. A rotating compensator ellipsometer is used which generates both 2ω and 4ω output signals. The 4ω omega signal is used to provide an indication of the temperature of the sample. This information is used to correct the analysis of the thin film based on the 2ω signal. These two different signals generated by a single device provide independent measurements of temperature and thickness and can be used to accurately analyze a sample whose temperature is unknown.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.