Diagnosis method for semiconductor processing apparatus
US6899766B2 · kind B2 · utility
3Cited by
4References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 20, 2004 |
| Grant date | May 31, 2005 |
| Priority date | — |
| Expiry date | Feb 20, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of diagnosing a semiconductor processing apparatus for imparting plasma treatment to a sample arranged in a vacuum process chamber, which apparatus includes a plasma generator for generating plasma inside the vacuum process chamber and process gas introducer for introducing a process gas into the vacuum process chamber, includes the steps of imparting mechanical oscillation to the semiconductor processing apparatus and detecting mechanical oscillation generated by the step of imparting mechanical oscillation inside the semiconductor processing apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.