Inventor · Tokyo, JP

Go Miya

21Patents
4h-index
28Co-inventors
59Inventor score

Filing activity: Aug 28, 2002 → Dec 23, 2019

Most-cited inventions

PatentTitleAreaCited byStatus
US7396771B2 Plasma etching apparatus and plasma etching method Electricity 8 Active
US7887669B2 Vacuum processing apparatus Electricity 6 Active
US8232522B2 Semiconductor inspecting apparatus Electricity 4 Active
US9401297B2 Electrostatic chuck mechanism and charged particle beam apparatus Electricity 4 Active
US10872742B2 Charged particle beam device Electricity 4 Active
US8083889B2 Apparatus and method for plasma etching Electricity 4 Active
US7744721B2 Plasma processing apparatus Electricity 4 Active
US6866744B2 Semiconductor processing apparatus and a diagnosis method therefor Electricity 3 Expired
US6899766B2 Diagnosis method for semiconductor processing apparatus Electricity 3 Expired
US7713756B2 Apparatus and method for plasma etching Electricity 2 Active
US8653455B2 Charged particle beam device and evaluation method using the charged particle beam device Electricity 2 Active
US8519332B2 Semiconductor inspecting apparatus Electricity 2 Active
US7147747B2 Plasma processing apparatus and plasma processing method Electricity 1 Expired
US9799486B2 Charged particle beam apparatus for measuring surface potential of a sample Electricity 0 Active
US10128141B2 Plasma processing apparatus and plasma processing method Electricity 0 Active
US12106930B2 Charged particle beam device Electricity 0 Active
US11735394B2 Charged particle beam apparatus Electricity 0 Active
US9704731B2 Plasma processing apparatus and plasma processing method Electricity 0 Active
US8231759B2 Plasma processing apparatus Electricity 0 Active
US7147748B2 Plasma processing method Electricity 0 Expired
US8921781B2 Measurement or inspecting apparatus Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.