Focused ion beam system with coaxial scanning electron microscope
US6900447B2 · kind B2 · utility
53Cited by
6References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 6, 2003 |
| Grant date | May 31, 2005 |
| Priority date | — |
| Expiry date | Sep 22, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.