Step and repeat imprint lithography systems
US6900881B2 · kind B2 · utility
195Cited by
113References
84Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2002 |
| Grant date | May 31, 2005 |
| Priority date | — |
| Expiry date | Mar 2, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0271
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.