Norman E. Schumaker
18Patents
13h-index
19Co-inventors
75Inventor score
Filing activity: Oct 31, 1974 → May 16, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6900881B2 | Step and repeat imprint lithography systems | Electricity | 195 | Expired |
| US7077992B2 | Step and repeat imprint lithography processes | Physics | 183 | Expired |
| US7070405B2 | Alignment systems for imprint lithography | Performing Operations; Transporting | 147 | Expired |
| US4838983A | Gas treatment apparatus and method | Chemistry; Metallurgy | 80 | Expired |
| US6980282B2 | Method for modulating shapes of substrates | Physics | 43 | Expired |
| US7019819B2 | Chucking system for modulating shapes of substrates | Performing Operations; Transporting | 41 | Expired |
| US7635445B2 | Method of separating a mold from a solidified layer disposed on a substrate | Emerging Cross-Sectional Technologies | 23 | Active |
| US6982783B2 | Chucking system for modulating shapes of substrates | Performing Operations; Transporting | 22 | Expired |
| US3964157A | Method of mounting semiconductor chips | Electricity | 22 | Expired |
| US4772356A | Gas treatment apparatus and method | Emerging Cross-Sectional Technologies | 18 | Expired |
| US4969416A | Gas treatment apparatus and method | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7224443B2 | Imprint lithography substrate processing tool for modulating shapes of substrates | Performing Operations; Transporting | 15 | Expired |
| US3950195A | LPE technique for reducing edge growth | Electricity | 13 | Expired |
| US4313125A | Light emitting semiconductor devices | Electricity | 13 | Expired |
| US7727453B2 | Step and repeat imprint lithography processes | Physics | 11 | Active |
| US8318066B2 | Step and repeat imprint lithography process | Physics | 4 | Active |
| US7261830B2 | Applying imprinting material to substrates employing electromagnetic fields | Performing Operations; Transporting | 2 | Expired |
| US7943081B2 | Step and repeat imprint lithography processes | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.