Delivery systems for efficient vaporization of precursor source material
US6909839B2 · kind B2 · utility
567Cited by
1References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2003 |
| Grant date | Jun 21, 2005 |
| Priority date | — |
| Expiry date | Jul 23, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D1/0082
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention relates to a delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.