Method of etching a magnetic material
US6911346B2 · kind B2 · utility
4Cited by
5References
38Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 21, 2003 |
| Grant date | Jun 28, 2005 |
| Priority date | — |
| Expiry date | Mar 21, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03J2200/36
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of etching a magnetic material (e.g., nickel-iron alloy (NiFe), cobalt-iron alloy (CoFe), and the like) using a gas mixture comprising a hydrogen halide gas and a fluorocarbon-containing gas is disclosed. The method provides high etch selectivity for the magnetic materials over non-magnetic dielectric materials, such as aluminum oxide (Al2O3) and the like, as well as to photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.