Xiaoyi Chen
24Patents
8h-index
39Co-inventors
75Inventor score
Filing activity: Dec 22, 2000 → Apr 7, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6759263B2 | Method of patterning a layer of magnetic material | Emerging Cross-Sectional Technologies | 65 | Expired |
| US6964928B2 | Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask | Electricity | 33 | Expired |
| US6841484B2 | Method of fabricating a magneto-resistive random access memory (MRAM) device | Electricity | 25 | Expired |
| US6984585B2 | Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer | Electricity | 22 | Expired |
| US6821907B2 | Etching methods for a magnetic memory cell stack | Electricity | 17 | Expired |
| US7320942B2 | Method for removal of metallic residue after plasma etching of a metal layer | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6942813B2 | Method of etching magnetic and ferroelectric materials using a pulsed bias source | Electricity | 12 | Expired |
| US7105361B2 | Method of etching a magnetic material | Electricity | 9 | Expired |
| US6933239B2 | Method for removing conductive residue | Electricity | 8 | Expired |
| US6911346B2 | Method of etching a magnetic material | Electricity | 4 | Expired |
| US6692648B2 | Method of plasma heating and etching a substrate | Electricity | 3 | Expired |
| US7829243B2 | Method for plasma etching a chromium layer suitable for photomask fabrication | Physics | 2 | Active |
| US7635546B2 | Phase shifting photomask and a method of fabricating thereof | Physics | 1 | Active |
| US6709609B2 | Plasma heating of a substrate with subsequent high temperature etching | Electricity | 1 | Expired |
| US11047601B2 | Method and system of high-temperature calcium looping thermochemical energy storage | Emerging Cross-Sectional Technologies | 1 | Active |
| US11537503B2 | Code editor for user interface component testing | Physics | 1 | Active |
| US12134144B2 | Welding mark inspection method and apparatus, and electronic device | Physics | 0 | Active |
| US10199224B2 | Method for improving CD micro-loading in photomask plasma etching | Electricity | 0 | Active |
| US12361288B2 | Method, device and medium for diagnosing and optimizing data analysis system | Physics | 0 | Active |
| US9425062B2 | Method for improving CD micro-loading in photomask plasma etching | Electricity | 0 | Active |
| US10776133B2 | Preemptive loading of code dependencies for improved performance | Electricity | 0 | Active |
| US12246459B2 | System and/or method of cooperative dynamic insertion scheduling of independent agents | Physics | 0 | Active |
| US10115572B2 | Methods for in-situ chamber clean in plasma etching processing chamber | Electricity | 0 | Active |
| US10282818B2 | Image deformation processing method, device and storage medium | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.