Removable reticle window and support frame using magnetic force
US6912043B2 · kind B2 · utility
20Cited by
3References
30Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 27, 2003 |
| Grant date | Jun 28, 2005 |
| Priority date | — |
| Expiry date | Oct 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70983
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for maintaining an optical gap between a pellicle and a reticle in a photolithography system includes a frame defining first and second opposing surfaces, a reticle mated to the first opposing surface using magnetic coupling; and a pellicle mated to the second opposing surface using magnetic coupling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.