Apparatus and method for enhanced voltage contrast analysis
US6914443B2 · kind B2 · utility
2Cited by
10References
72Claims
0Family size
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Key dates
| Filing date | Apr 29, 2003 |
| Grant date | Jul 5, 2005 |
| Priority date | — |
| Expiry date | Apr 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/307
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method is provided for testing the resistance of a test wafer having multiple conductors. Embodiments include a method having the steps of providing a signal that is substantially larger than a signal threshold to a test structure; and scanning at least two conductors of the test structure, that are electrically couplet to each other, by a limited voltage resolution SEM. Charged particles emitted from the at least two conductors as a result of the scanning are collected, thus providing an indication about a resistance of the at least two conductors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.