Resist composition
US6916593B2 · kind B2 · utility
30Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2003 |
| Grant date | Jul 12, 2005 |
| Priority date | — |
| Expiry date | Jul 9, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.