Substrate positioning system
US6921907B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 12, 2004 |
| Grant date | Jul 26, 2005 |
| Priority date | — |
| Expiry date | Jul 12, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate positioning system is provided to facilitate the performing of certain processing on the substrate, such as ion implantation. The system comprises a linkage rotatably mounted to a base and an end effector member rotatably mounted to the linkage and configured for receiving a substrate. Through the synchronized rotation of the linkage about the base and the end effector member about the linkage, the system acts as a robotic unit to move the substrate to the desired location for performing processing thereon. In another aspect, the base is movable along an axis such that the system maintains a constant distance of travel for an ion beam incident on the substrate as the linkage and end effector member travel in a curved path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.