Developing photoresist with supercritical fluid and developer
US6924086B1 · kind B1 · utility
5Cited by
173References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2003 |
| Grant date | Aug 2, 2005 |
| Priority date | — |
| Expiry date | Feb 14, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3021
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of developing a polymeric film without the need for a water rinse step. An object having a surface supporting a polymeric film is placed onto a support region within a pressure chamber. A fluid and developer is introduced into the pressure chamber and the object is processed at supercritical conditions to develop the polymeric film such that the polymeric film is not substantially deformed. The pressure chamber is then vented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.