Paul Schilling
12Patents
6h-index
14Co-inventors
55Inventor score
Filing activity: Dec 12, 1997 → Mar 30, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6500605B1 | Removal of photoresist and residue from substrate using supercritical carbon dioxide process | Electricity | 54 | Expired |
| US6270395A | Oxidizing polishing slurries for low dielectric constant materials | Emerging Cross-Sectional Technologies | 32 | Expired |
| US6124421A | Poly(arylene ether) compositions and methods of manufacture thereof | Emerging Cross-Sectional Technologies | 30 | Expired |
| US6890853B2 | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module | Emerging Cross-Sectional Technologies | 25 | Expired |
| US6610114B2 | Oxidizing polishing slurries for low dielectric constant materials | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6928746B2 | Drying resist with a solvent bath and supercritical CO2 | Physics | 8 | Expired |
| US6924086B1 | Developing photoresist with supercritical fluid and developer | Physics | 5 | Expired |
| US7169540B2 | Method of treatment of porous dielectric films to reduce damage during cleaning | Electricity | 3 | Expired |
| US7270941B2 | Method of passivating of low dielectric materials in wafer processing | Electricity | 1 | Expired |
| US7399708B2 | Method of treating a composite spin-on glass/anti-reflective material prior to cleaning | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7208411B2 | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module | Emerging Cross-Sectional Technologies | 0 | Expired |
| US7044662B2 | Developing photoresist with supercritical fluid and developer | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.