Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US6927840B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 7, 2004 |
| Grant date | Aug 9, 2005 |
| Priority date | — |
| Expiry date | May 7, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/682
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask having a mask pattern is provided on a mask table. A substrate is provided on a substrate table. The mask is irradiated to project an image of at least a portion of the mask pattern onto a radiation-sensitive layer of the substrate using a projection system. At least one of the mask and substrate tables is positioned using a drive unit having a stationary part coupled to a reaction frame. A position of at least one of the mask and substrate tables is measured using a measuring system having a plurality of measurement sensors that have a stationary part and a movable part. The movable part of one of the sensors is coupled to the one of the mask table and the substrate table whose position is measured, and the stationary parts of the sensors are coupled to a support frame mechanically isolated from the reaction frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.