Drying resist with a solvent bath and supercritical CO2
US6928746B2 · kind B2 · utility
8Cited by
188References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2003 |
| Grant date | Aug 16, 2005 |
| Priority date | — |
| Expiry date | May 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for drying an object, having a polymeric film, wherein the object is submerged in a rinse liquid. The object is removed from the rinse liquid and the object is placed in a solvent bath before a sufficient amount of the rinse liquid can evaporate from the object. The density of a solvent in the solvent bath depends on a direction of orientation of the polymeric film with respect to a force. The object is removed from the solvent bath. A drying process is performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.