Patent · US Expired

Configuration for determining a concentration of contaminating particles in a loading and unloading chamber of an appliance for processing at least one disk-like object

US6928892B2 · kind B2 · utility

18Cited by
1References
24Claims
0Family size

Assignees

Inventors

Key dates

Filing dateSep 3, 2002
Grant dateAug 16, 2005
Priority date
Expiry dateSep 4, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N15/06
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A configuration for measuring the concentration of contaminating particles at high time resolution in the mini environments of loading and unloading chambers of processing appliances in semiconductor fabrication includes a probe, a movement unit for the probe, a particle detector, vacuum pump and a control unit. Reaching critical layer thicknesses of disk carriers or boats in ovens, and maladjustments of handling systems for wafers, masks, flat panel displays and other disc-like objects can be detected in terms of the cause and quantified immediately. The movement unit moves the probe to a desired position in the loading and unloading chamber as a reaction to the positioning of the handling system. A method of operating the configuration is also provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.