Configuration for determining a concentration of contaminating particles in a loading and unloading chamber of an appliance for processing at least one disk-like object
US6928892B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 3, 2002 |
| Grant date | Aug 16, 2005 |
| Priority date | — |
| Expiry date | Sep 4, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N15/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A configuration for measuring the concentration of contaminating particles at high time resolution in the mini environments of loading and unloading chambers of processing appliances in semiconductor fabrication includes a probe, a movement unit for the probe, a particle detector, vacuum pump and a control unit. Reaching critical layer thicknesses of disk carriers or boats in ovens, and maladjustments of handling systems for wafers, masks, flat panel displays and other disc-like objects can be detected in terms of the cause and quantified immediately. The movement unit moves the probe to a desired position in the loading and unloading chamber as a reaction to the positioning of the handling system. A method of operating the configuration is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.