Substrate processing apparatus
US6932884B2 · kind B2 · utility
12Cited by
6References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 4, 2002 |
| Grant date | Aug 23, 2005 |
| Priority date | — |
| Expiry date | Sep 4, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67051
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus comprises roll chucks for holding and rotating a substrate, a closable chamber housing the roll chucks therein, and a gas introduction pipe for introducing a gas into the chamber. The substrate processing apparatus further comprises an etching unit for etching and cleaning a peripheral portion of the substrate while the substrate is being rotated by the roll chucks, and a first supply passage for supplying a first liquid to the etching unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.