Laser-produced plasma EUV light source with isolated plasma

US6933515B2 · kind B2 · utility

Assignee

• University of Central Florida Research Foundation · US

Inventors

• Jeffrey S. Hartlove · Rancho Palos Verdes, US
• Mark E. Michaelian · Torrance, US
• Henry Shields · San Diego, US
• Steven W. Fornaca · Torrance, US
• Stuart McNaught · Redondo Beach, US
• Fernando Martos · Creve Coeur, US
• Richard H. Moyer · Lomita, US

Key dates

• Filing date: Jun 26, 2003
• Grant date: Aug 23, 2005
• Expiry date: Oct 15, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05G2/0082
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

An EUV radiation source (40) that includes a nozzle (42) positioned a far enough distance away from a target region (50) so that EUV radiation (56) generated at the target region (50) by a laser beam (54) impinging a target stream (46) emitted from the nozzle (42) is not significantly absorbed by target vapor proximate the nozzle (42). Also, the EUV radiation (56) does not significantly erode the nozzle (42) and contaminate source optics (34). In one embodiment, the nozzle (42) is more than 10 cm away from the target region (50).