Process for the decontamination of microlithographic projection exposure devices

US6936825B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Michael Gerhard · Aalen, DE
• Nils Dieckmann · Wertingen, DE
• Christine Sieler · Gerstetten, DE
• Marcus Zehetbauer · Oberkochen, DE
• Martin Schriever · Aalen, DE
• Gerd Reisinger · Oberkochen, DE

Key dates

• Filing date: Jan 3, 2001
• Grant date: Aug 30, 2005
• Expiry date: Apr 26, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70925
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.