Patent · US Expired

Lithographic apparatus, device manufacturing method and device manufactured thereby

US6937316B2 · kind B2 · utility

2Cited by
8References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 13, 2002
Grant dateAug 30, 2005
Priority date
Expiry dateOct 27, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/709
  • WIPO fieldMechanical elements
  • WIPO sectorMechanical engineering

Abstract

A bellows used to connect two sealed compartments of the lithographic apparatus or a compartment and a pump, comprises a first section having smooth helical corrugations and a second section that can accommodate the longitudinal movement caused by relative rotation of the ends of the first section. The second section may be a mirror image of the first section or one or more sub-sections of circumferential corrugations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.