Patent · US Expired

Method and system for measuring the topography of a sample

US6940609B2 · kind B2 · utility

11Cited by
12References
28Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 8, 2002
Grant dateSep 6, 2005
Priority date
Expiry dateMar 13, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B11/254
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An imaging method and system are presented for detecting the topography of a sample surface. Illuminating light is directed to the sample by sequentially passing the illuminating light through a grating and an objective lens arrangement The grating has a pattern formed by spaced-apart transparent regions spaced by non-transparent regions, and is specifically oriented with respect to the optical axis of the objective lens arrangement. Light, specularly reflected from the sample, is collected by the same objective lens arrangement and is directed to an imaging detector through the same grating, thereby enabling creation of an image of the illuminated sample indicative of the topography of the sample surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.