Patent · US Expired

Wafer having alignment marks extending from a first to a second surface of the wafer

US6943429B1 · kind B1 · utility

284Cited by
20References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 8, 2001
Grant dateSep 13, 2005
Priority date
Expiry dateSep 9, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/0002
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A marked wafer includes a front-side surface and a back-side surface. A vertical scribe line and a horizontal scribe line are on the front-side surface of the wafer. A back-side alignment mark is located at an intersection of the vertical scribe line and the horizontal scribe line. The back-side alignment mark extends from the front-side surface to the back-side surface of the wafer. The back-side alignment mark is used to aligning a saw, which singulates the wafer from the back-side surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.