Wafer having alignment marks extending from a first to a second surface of the wafer
US6943429B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2001 |
| Grant date | Sep 13, 2005 |
| Priority date | — |
| Expiry date | Sep 9, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A marked wafer includes a front-side surface and a back-side surface. A vertical scribe line and a horizontal scribe line are on the front-side surface of the wafer. A back-side alignment mark is located at an intersection of the vertical scribe line and the horizontal scribe line. The back-side alignment mark extends from the front-side surface to the back-side surface of the wafer. The back-side alignment mark is used to aligning a saw, which singulates the wafer from the back-side surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.