Critical dimension measuring instrument

US6943901B2 · kind B2 · utility

Assignee

• Leica Microsystems Semiconductor GmbH · DE

Inventors

• Franz Cemic · Hachenburg, DE
• Lambert Danner · Wetzlar, DE

Key dates

• Filing date: Sep 26, 2003
• Grant date: Sep 13, 2005
• Expiry date: Sep 26, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G01B11/00
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A critical dimension measuring instrument includes a light source, a beam-shaping optical system, a condenser having a condenser pupil, a first microlens array arrangement, a first auxiliary optical element having positive refractive power, a second auxiliary optical element having positive refractive power, and a second microlens array arrangement. The first microlens array arrangement, the first auxiliary optical element, the second auxiliary optical element and the second microlens array arrangement are arranged in successive fashion between the beam-shaping optical system and the condenser.