Patent · US Expired

Negative resist process with simultaneous development and aromatization of resist structures

US6946236B2 · kind B2 · utility

1Cited by

5References

8Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Jörg Rottstegge · Erlangen, DE
Eberhard Kuhn · Hemhofen, DE
Christian Eschbaumer · Arnstorf, DE
Gertrud Falk · Erlangen, DE
Michael Sebald · Waischenfeld, DE

Key dates

Filing date	Jul 1, 2002
Grant date	Sep 20, 2005
Priority date	—
Expiry date	Nov 16, 2022

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/40
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to a process for producing amplified negative resist structures in which, following exposure and contrasting of the resist, the resist structure is simultaneously developed and aromatized. This substantially simplifies the production of amplified resist structures. Amplifying agents include compounds having not only a reactive group for attachment to an anchor group of the polymer, but also at least one aromatic group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.