Method of fabricating heteroepitaxial microstructures
US6946317B2 · kind B2 · utility
11Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 3, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Jan 13, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76254
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An efficient method of fabricating a high-quality microstructure having a smooth surface. The method includes detaching a layer from a base structure to provide a carrier substrate having a detached surface, and then forming a microstructure on the detached surface of the carrier substrate by depositing an epitaxial layer on the detached surface of a carrier substrate. Also included is a microstructure fabricated from such method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.