Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing method
US6946662B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 10, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Jan 19, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1205
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
There is provided a multi-charged beam lens constituted by stacking, via fiber chips serving as insulator members along the optical path of a charged beam, a plurality of electrodes having a charged beam passing region where a plurality of charged beam apertures are formed. The electrodes have shield apertures between the charged beam passing region and the fiber chips. A conductive shield extends through the shield apertures without contacting the electrodes, and cuts off a straight path which connects the charged beam passing region and the fiber chips serving as insulator members. This prevents the influence of charge-up of the insulator members on an electron beam in the multi-charged beam lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.