Method for calibration of a metrology stage
US6948254B2 · kind B2 · utility
9Cited by
13References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2003 |
| Grant date | Sep 27, 2005 |
| Priority date | — |
| Expiry date | Oct 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a method for calibrating a metrology stage in at least two dimensions using an artefact plate having marks forming a pattern, comprising the steps of: placing the artefact plate on the metrology stage in at least three positions, assuming the geometrical properties of the metrology stage and the artefact plate, and the positions of the artefact plate for each measurement, forming a model predicting the measurements of the artefact plate, measuring the marks by the metrology stage, and inverting said model to improve the assumptions on metrology stage and artefact plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.