Ceramic heater system and substrate processing apparatus having the same installed therein
US6951587B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 28, 2000 |
| Grant date | Oct 4, 2005 |
| Priority date | — |
| Expiry date | Nov 28, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4586
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A ceramic heater system has a ceramic heater base having a substrate-mounting surface formed on the top surface thereof and a heater, buried in the heater base, for heating a substrate. A fluid passage is formed buried in the heater base below where the heater is buried. The heater base is cooled as a fluid whose temperature is lower than the temperature of the heater base is let flow in the fluid passage. A substrate processing apparatus has the ceramic heater system installed in a process chamber whose vacuum state can be maintained, a gas supply mechanism for feeding a gas into the process chamber, and a power supply. The substrate processing apparatus performs a heat treatment, etching and film deposition on a substrate placed in the process chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.