Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography

US6954275B2 · kind B2 · utility

Assignee

• Boards of Regents, The University of Texas System · US

Inventors

• Byung-Jin Choi · Round Rock, US
• Matthew E. Colburn · Hopewell Junction, US
• S. Sreenivasan · Austin, US
• C. Grant Willson · Austin, US
• Todd C. Bailey · Poughkeepsie, US
• John Ekerdt · Austin, US

Key dates

• Filing date: Aug 1, 2001
• Grant date: Oct 11, 2005
• Expiry date: Jul 31, 2022

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B29C2043/025
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.