Artificial intelligence system for track defect problem solving

US6954678B1 · kind B1 · utility

Assignee

• Advanced Micro Devices, Inc. · US

Inventors

• Khoi A. Phan · San Jose, US
• Bhanwar Singh · معلمی نژاد, US
• Bharath Rangarajan · Santa Clara, US
• Ramkumar Subramanian · Sunnyvale, US

Key dates

• Filing date: Sep 30, 2002
• Grant date: Oct 11, 2005
• Expiry date: Nov 19, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G05B23/0286
• WIPO field: Control
• WIPO sector: Instruments

Abstract

A system and method facilitating lithography defect solution generation is provided. The invention includes a defect solution component and a defect alert component. The defect solution component provides potential solution(s) to a defect within the lithography process utilizing artificial intelligence technique(s) (e.g., Bayesian learning methods that perform analysis over alternative dependent structures and apply a score, Bayesian classifiers and other statistical classifiers, including decision tree learning methods, support vector machines, linear and non-linear regression and/or neural network).