Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy
US6958484B2 · kind B2 · utility
16Cited by
8References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 28, 2001 |
| Grant date | Oct 25, 2005 |
| Priority date | — |
| Expiry date | Oct 9, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32972
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A multi-point detection method and system for analyzing a composition within an examination area. The system simultaneously acquires multi-dimensional distributions (e.g., two- or three-dimensional distributions) of plasma optical emissions at at least two wavelengths. Such diagnostics are useful for real-time spatially-resolved measurements of plasma electron temperature distributions and/or chemical species concentrations within a plasma processing chamber (50). Generally, the system analyzes/diagnoses the measurement of line-of-sight light emission or absorption in the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.