Patent · US Expired

Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method

US6963449B2 · kind B2 · utility

5Cited by

5References

10Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Birgit Mecking · Aalen, DE
Toralf Gruner · Hennef (Sieg), DE
Alexander Kohl · Aalen, DE

Key dates

Filing date	Apr 13, 2004
Grant date	Nov 8, 2005
Priority date	—
Expiry date	Apr 13, 2024

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S359/90
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.